In-situ photoluminescence measurements during MOVPE growth of GaN and InGaN MQW structures

Publication date: 1 April 2015
Source:Journal of Crystal Growth, Volume 415
Author(s): C. Prall , C. Kaspari , F. Brunner , K. Haberland , M. Weyers , D. Rueter
In this work we report the first quasi-continuous in-situ photoluminescence study of growing InGaN LED structures inside an industrial-grade metal-organic vapor phase epitaxy (MOVPE) reactor at growth temperature. The photoluminescence spectra contain information about temperature, thickness and composition of the epitaxial layers. Furthermore, the in-situ spectra – even at an early stage of the growth of the active region – can be used to predict the photoluminescence emission wavelength of the structure at room temperature. In this study an accuracy of this predicted wavelength in the range of ± 1.3 nm (2σ) is demonstrated. This technique thus appears suitable for closed-loop control of the emission wavelength of InGaN LEDs already during growth.