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Channel: ScienceDirect Publication: Journal of Crystal Growth
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Aperiodic SiSn/Si multilayers for thermoelectric applications

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Publication date: 15 April 2014
Source:Journal of Crystal Growth, Volume 392
Author(s): A.A. Tonkikh , N.D. Zakharov , C. Eisenschmidt , H.S. Leipner , P. Werner
We report on novel defect-free SiSn/Si heterostructures grown pseudomorphically on Si(001) substrates using temperature-modulated molecular beam epitaxy. This approach results in a sustainable epitaxial growth for SiSn/Si multilayers. Transmission electron microscopy and electron diffraction manifest that SiSn layers possess a diamond lattice structure. X-ray diffraction reveals up to 9.5 at% Sn in the crystal lattice of SiSn layers.


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