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Growth and characterization of single crystalline Zn0.8–xMg0.2AlxO films with UV band gap on GaN/Al2O3 template by RF magnetron sputtering

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1 February 2013
Publication year: 2013
Source:Journal of Crystal Growth, Volume 364

Single crystalline Zn0.8− x Mg0.2Al x O thin films were grown on a GaN/Al2O3 template. As the Al content is increased from 0 to 0.06, the optical band gap increased from 3.6eV to 4.0eV, growth rate decreased from 6nm/min to 3nm/min, and the surface roughness decreased from 17nm to 0.8nm. It was observed that interfacial layers were formed between the thin films and the substrates, identified as cubic MgAl2O4 in the case of ZnMgAlO/GaN and cubic MgO in the case of ZnMgO/GaN. It was proposed that the MgAl2O4 layer, with low lattice mismatch of ∼7% against the GaN substrate, acted as the buffer layer to correlate the film and the substrate, resulting in growth of the single crystalline thin films in the case of the ZnMgAlO/GaN system.

Highlights

► Single crystalline Zn0.8− x Mg0.2Al x O thin films were grown on a GaN/Al2O3 template. ► We studied effect of Al concentration on the characteristics of Zn0.8− x Mg0.2Al x O films. ► It was observed that interfacial layers formed between the thin films and the GaN/Al2O3 template by TEM.

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