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Channel: ScienceDirect Publication: Journal of Crystal Growth
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A comprehensive diagram to grow (0001)InGaN alloys by molecular beam epitaxy

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1 February 2013
Publication year: 2013
Source:Journal of Crystal Growth, Volume 364

The composition, strain and surface morphology of (0001)InGaN layers are investigated as a function of growth temperature (460–645°C) and impinging In flux. Three different growth regimes: nitrogen-rich, metal-rich and intermediate metal-rich, are clearly identified and found to be in correlation with surface morphology and strain relaxation. Best epilayers’ quality is obtained when growing under intermediate metal-rich conditions, with 1–2 monolayers thick In ad-coverage. For a given In flux, the In incorporation decreases with increasing growth temperature due to InN thermal decomposition that follows an Arrhenius behavior with 1.84±0.12eV activation energy.

Highlights

► Study of In incorporation as functions of growth temperature and impinging In flux. ► InGaN surface morphology strongly correlated to the growth regime. ► InGaN growth diagram constructed. Growth regimes’ borders analytically determined. ► InGaN epilayer relaxation rate dependent on growth regime. ► Difference in In incorporation into InAlN and InGaN explained by their decomposition parameters.

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