Novel activation process for Mg-implanted GaN

Publication date: 15 February 2014
Source:Journal of Crystal Growth, Volume 388
Author(s): Shin Hashimoto , Takao Nakamura , Yoshio Honda , Hiroshi Amano
A novel activation process for Mg-implanted GaN was demonstrated. As opposed to the conventional thermal annealing process, an H2/NH3 alternating supply annealing process achieved better optical activation, stronger near-ultraviolet luminescence and weaker yellow luminescence in the photoluminescence spectroscopy. After this process, small hexagonal hillocks were observed on the surface, which indicated that crystal regrowth was induced by this process, consisting of decomposition of GaN by H2 supplies and re-crystallization by NH3 supplies. It was revealed that the implanted Mg could easily be located at the activation site by means of crystal regrowth by this process.